SHOWERHEAD WITH CONTROLLED VAPOR DEPOSITION UNIFORMITY
卷宗概要
发明人
Hyman Lam; Shinjae Hwang; Ziyun Huang; Yun-Tai Yeh; Vince Kirchhoff; Dien-Yeh Wu; Chengyu Wen
IPC 分类
CPC 分类
A vapor deposition chamber showerhead faceplate having a thickness and a plurality of zones between a center of the faceplate and the peripheral edge. The faceplate includes a plurality of gas openings, each of the plurality of gas openings comprising an overall length that extends through the thickness of the showerhead faceplate, the overall length defined by an upper part having an upper part length and a lower part having a lower part length, the upper part having a first diameter and the lower part having a second diameter that is less than the first diameter, wherein the lower part length of a first portion of the plurality of gas openings in a first zone is different than the lower part length of a second portion of the plurality of gas openings in a second zone.
原文（中文）
A vapor deposition chamber showerhead faceplate having a thickness and a plurality of zones between a center of the faceplate and the peripheral edge. The faceplate includes a plurality of gas openings, each of the plurality of gas openings comprising an overall length that extends through the thickness of the showerhead faceplate, the overall length defined by an upper part having an upper part length and a lower part having a lower part length, the upper part having a first diameter and the lower part having a second diameter that is less than the first diameter, wherein the lower part length of a first portion of the plurality of gas openings in a first zone is different than the lower part length of a second portion of the plurality of gas openings in a second zone.