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INDIUM PHOSPHIDE SINGLE-CRYSTAL SUBSTRATE AND MANUFACTURING METHOD FOR INDIUM PHOSPHIDE SINGLE-CRYSTAL

发明专利审中
8权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Yuka KIDO; Ryoji SAKAMOTO; Takuya YANAGISAWA; Yusuke YOSHIZUMI; Katsushi HASHIO

IPC 分类

C30B 29/40C30B 11/C30B 29/60C30B 33/

CPC 分类

C30B29/40C30B11/3C30B11/6C30B29/60C30B33/

The indium phosphide single-crystal substrate has a circular main surface, and the main surface is virtually divided with a square grid at a grid interval of 1 mm. The square grid is composed of a plurality of grid points present along a first direction and a second direction orthogonal to the first direction. A set consisting of dislocation densities measured at the respective grid points has a first whole-surface mean as the mean of the set and a first whole-surface standard deviation as the standard deviation of the set, and each of the dislocation densities is classified as any one of a first level, a second level, and a third level. The grid points each determined to have a dislocation density classified as the second level are present in a region between an outline of a first square region and an outline of a second square region.

原文(中文)

The indium phosphide single-crystal substrate has a circular main surface, and the main surface is virtually divided with a square grid at a grid interval of 1 mm. The square grid is composed of a plurality of grid points present along a first direction and a second direction orthogonal to the first direction. A set consisting of dislocation densities measured at the respective grid points has a first whole-surface mean as the mean of the set and a first whole-surface standard deviation as the standard deviation of the set, and each of the dislocation densities is classified as any one of a first level, a second level, and a third level. The grid points each determined to have a dislocation density classified as the second level are present in a region between an outline of a first square region and an outline of a second square region.