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SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
发明专利审中
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18权利要求 · 2 独立
§ Ⅰ
卷宗概要
发明人
Sumin JANG; Soobin LIM; Yunju CHAE; Joonhee HAN; Hyun LEE; Jimin KIM; Kyungmog KIM; Dong Wan RYU; Minki CHON
IPC 分类
G3F 7/4C7F 7/22G3F 7/H1L 21/311H1L 21/3213
CPC 分类
G3F7/42C7F7/2208G3F7/45G3F7/70033H1L21/31144H1L21/32139
Disclosed are a semiconductor photoresist composition and a method of forming patterns using the same, the semiconductor photoresist composition including an organometallic compound; a mono-carboxylic acid compound; an organic acid compound substituted with at least two carboxyl groups; and a solvent.
原文（中文）
Disclosed are a semiconductor photoresist composition and a method of forming patterns using the same, the semiconductor photoresist composition including an organometallic compound; a mono-carboxylic acid compound; an organic acid compound substituted with at least two carboxyl groups; and a solvent.