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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

发明专利审中
13权利要求 · 1 独立
§ Ⅰ

卷宗概要

发明人

Akihiro Kaneko; Akiyoshi Goto

IPC 分类

G3F 7/4C7C 25/18C7C 309/17C7C 309/19C7C 309/24C7C 309/29C7C 313/4C7C 381/12C7D 295/145C7D 309/12C7D 327/6C7D 333/46C7D 333/48C7D 333/76C7D 493/18G3F 7/38G3F 7/39H1L 21/27

CPC 分类

G3F7/45C7C25/18C7C309/17C7C309/19C7C309/24C7C309/29C7C313/4C7C381/12C7D295/145C7D309/12C7D327/6C7D333/46C7D333/48C7D333/76C7D493/18G3F7/46G3F7/382G3F7/388G3F7/397H1L21/274C7C2601/14C7C2603/74C7C2603/86

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin which provides increased polarity by action of an acid, an onium salt (A) including a sulfonate anion and not including a fluorine atom and a specified structure, and an onium salt (B) including the specified structure and not including a fluorine atom, a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for producing an electronic device.

原文(中文)

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin which provides increased polarity by action of an acid, an onium salt (A) including a sulfonate anion and not including a fluorine atom and a specified structure, and an onium salt (B) including the specified structure and not including a fluorine atom, a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for producing an electronic device.