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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

发明专利审中
13权利要求 · 1 独立
§ Ⅰ

卷宗概要

发明人

Akihiro Kaneko; Akiyoshi Goto

IPC 分类

G3F 7/4G3F 7/39G3F 7/20G3F 7/32

CPC 分类

G3F7/45G3F7/39G3F7/20G3F7/32

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which provides increased polarity by action of an acid, an onium salt (B) represented by a formula (1) described in the Specification, and a resin (C) satisfying specified conditions, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.

原文(中文)

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which provides increased polarity by action of an acid, an onium salt (B) represented by a formula (1) described in the Specification, and a resin (C) satisfying specified conditions, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.