PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN
卷宗概要
发明人
Saburo Kobayashi; Hayato Ouchi; Keiichi Ibata
IPC 分类
CPC 分类
A photosensitive composition capable of forming a fine pattern with high sensitivity and low roughness; a method for producing a patterned silicon-containing resin film using the photosensitive composition; and a silicon-containing resin that can be preferably incorporated into the photosensitive composition. The photosensitive composition includes a silicon-containing resin, a photoacid generating agent, and a cross-linking agent, and the silicon-containing resin has an aromatic group substituted with one or more iodine atoms.
原文（中文）
A photosensitive composition capable of forming a fine pattern with high sensitivity and low roughness; a method for producing a patterned silicon-containing resin film using the photosensitive composition; and a silicon-containing resin that can be preferably incorporated into the photosensitive composition. The photosensitive composition includes a silicon-containing resin, a photoacid generating agent, and a cross-linking agent, and the silicon-containing resin has an aromatic group substituted with one or more iodine atoms.