SUBSTRATE STRUCTURE
卷宗概要
发明人
Sungmoon PARK; Byounghoon KIM; Sung Woon UH; Eunhee JEANG; Dong-Wook KIM; Doo-Ho PARK; Sungmo YANG; Junho YOON
IPC 分类
CPC 分类
A substrate structure including a substrate, and an alignment mark on the substrate and configured to align an alignment of the substrate may be provided. The alignment mark may include a first main pattern in which a first main segment extending in a first direction repeats in a second direction perpendicular to the first direction, and a second main pattern in which a second main segment extending in the second direction repeats in the first direction. When viewed in a plan view, the first main pattern and the second main pattern ma define a quadrangle pattern, and the first main pattern and the second main pattern may be configured to diffract a light incident on the alignment mark.
原文（中文）
A substrate structure including a substrate, and an alignment mark on the substrate and configured to align an alignment of the substrate may be provided. The alignment mark may include a first main pattern in which a first main segment extending in a first direction repeats in a second direction perpendicular to the first direction, and a second main pattern in which a second main segment extending in the second direction repeats in the first direction. When viewed in a plan view, the first main pattern and the second main pattern ma define a quadrangle pattern, and the first main pattern and the second main pattern may be configured to diffract a light incident on the alignment mark.