PLASMA PROCESSING APPARATUS
卷宗概要
发明人
Takahiro SHINDO
IPC 分类
CPC 分类
A plasma processing apparatus includes a processing container, a substrate holder that holds a substrate and accommodated inside the processing container, and a plasma generation mechanism that generates an inductively-coupled plasma. The plasma generation mechanism includes a discharge chamber having a loop shape, an antenna including a magnetic core and a coil wound around the magnetic core, the antenna generating an induced current in the discharge chamber, and a radio-frequency power supply that supplies radio-frequency power to the coil.
原文（中文）
A plasma processing apparatus includes a processing container, a substrate holder that holds a substrate and accommodated inside the processing container, and a plasma generation mechanism that generates an inductively-coupled plasma. The plasma generation mechanism includes a discharge chamber having a loop shape, an antenna including a magnetic core and a coil wound around the magnetic core, the antenna generating an induced current in the discharge chamber, and a radio-frequency power supply that supplies radio-frequency power to the coil.