IN-LINE WAFER POSITIONING SYSTEM USING IR IMAGING
卷宗概要
发明人
Yi Kun Kelvin Goh; Han Yan Koh; Kok Keong Lim
IPC 分类
CPC 分类
Monitoring system for a semiconductor manufacturing processing tool and methods of monitoring a semiconductor manufacturing process tool are described. The monitoring system has a reflector positioned above a transfer robot in a transfer station of the processing tool. The reflector is configured to direct radiant energy from a processing chamber connected to the transfer station to a camera above the transfer station, the camera configured to measure infrared radiation from the processing chamber.
原文（中文）
Monitoring system for a semiconductor manufacturing processing tool and methods of monitoring a semiconductor manufacturing process tool are described. The monitoring system has a reflector positioned above a transfer robot in a transfer station of the processing tool. The reflector is configured to direct radiant energy from a processing chamber connected to the transfer station to a camera above the transfer station, the camera configured to measure infrared radiation from the processing chamber.