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SEMICONDUCTOR DEVICE WITH BOUND CHARGE LAYER AND ELECTRONIC SYSTEM INCLUDING THE SAME

发明专利审中
20权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Jaewoo PARK; Ji-Sung KIM; Jun-Noh LEE; Chang-Soo LEE; Haeyeon JUN

IPC 分类

H10B 43/27H1L 25/7H10B 43/35H10B 43/40H10B 51/20H10B 51/40H10B 80/

CPC 分类

H10B43/27H1L25/74H10B43/35H10B43/40H10B51/20H10B51/40H10B80/H1L2225/6506

A semiconductor device includes a substrate, a gate stacking structure, and a channel structure. The gate stacking structure includes a plurality of interlayer insulating layers and a plurality of gate electrodes alternately stacked on the substrate. The channel structure at least partially penetrates the gate stacking structure and extends in one direction. The channel structure includes a channel layer coupled with the substrate, a ferroelectric layer at least partially surrounding the channel layer and including a ferroelectric material, and a bound charge layer at least partially surrounding the ferroelectric material and including an insulating material. At least one of a conduction band energy level or a valence band energy level of the insulating material is disposed between a conduction band energy level and a valence band energy level of the ferroelectric material.

原文(中文)

A semiconductor device includes a substrate, a gate stacking structure, and a channel structure. The gate stacking structure includes a plurality of interlayer insulating layers and a plurality of gate electrodes alternately stacked on the substrate. The channel structure at least partially penetrates the gate stacking structure and extends in one direction. The channel structure includes a channel layer coupled with the substrate, a ferroelectric layer at least partially surrounding the channel layer and including a ferroelectric material, and a bound charge layer at least partially surrounding the ferroelectric material and including an insulating material. At least one of a conduction band energy level or a valence band energy level of the insulating material is disposed between a conduction band energy level and a valence band energy level of the ferroelectric material.