NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE
卷宗概要
发明人
Daisaburo TAKASHIMA
IPC 分类
CPC 分类
According to one embodiment, a non-volatile semiconductor memory device includes a plurality of first interconnect layers stacked apart from each other, a memory pillar passing through the plurality of first interconnect layers, a local bit line electrically coupled to the memory pillar, a bit line, a plurality of second interconnect layers stacked apart from each other, a first pillar passing through the plurality of second interconnect layers and electrically coupled to the local bit line, a second pillar passing through the plurality of second interconnect layers and electrically coupled to the bit line and the first pillar, a plurality of third interconnect layers stacked apart from each other, and a third pillar passing through the plurality of third interconnect layers and electrically coupled to the bit line. At least one of the plurality of third interconnect layers is electrically coupled to the local bit line.
原文（中文）
According to one embodiment, a non-volatile semiconductor memory device includes a plurality of first interconnect layers stacked apart from each other, a memory pillar passing through the plurality of first interconnect layers, a local bit line electrically coupled to the memory pillar, a bit line, a plurality of second interconnect layers stacked apart from each other, a first pillar passing through the plurality of second interconnect layers and electrically coupled to the local bit line, a second pillar passing through the plurality of second interconnect layers and electrically coupled to the bit line and the first pillar, a plurality of third interconnect layers stacked apart from each other, and a third pillar passing through the plurality of third interconnect layers and electrically coupled to the bit line. At least one of the plurality of third interconnect layers is electrically coupled to the local bit line.