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HETEROGENEOUS INTEGRATED CIRCUIT

发明专利审中
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20权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Tomas A. Palacios; Pradyot Yadav

IPC 分类

H10D 80/20H1L 23/H1L 25/H1L 25/7H1L 25/18H10D 80/30

CPC 分类

H10D80/251H1L24/13H1L24/16H1L24/81H1L25/74H1L25/18H1L25/50H10D80/30H1L2224/13147H1L2224/16145H1L2224/81203H1L2924/10253H1L2924/1033H1L2924/13064H1L2924/13091

Aspects of the present disclosure relate to a 3D-millimeter wave integrated circuit (3D-mmWIC configured to improve the efficiency and functionality of radio-frequency (RF) circuits through a multi-material, multi-layered architecture. These aspects can integrate silicon-based complementary metal-oxide semiconductor (CMOS) technology with other semiconductor materials, including Gallium Nitride (GaN), graphene, and/or various semiconductor alloys from the periodic table's Groups II-VI and/or III-V. The 3D-mmWIC can employ a layered structure comprising a silicon substrate, interleaved dielectric layers with embedded metal regions of varying thicknesses and lengths, a semiconductor layer, and/or additional oxide and dielectric layers. This architecture can enable the integration of multiple source, drain, and gate modules, interconnected via a sophisticated metal/oxide network. The disclosed integrated circuit architecture can provide significant advancements in RF circuit integration, offering reductions in size and cost while increasing design flexibility and performance.

原文(中文)

Aspects of the present disclosure relate to a 3D-millimeter wave integrated circuit (3D-mmWIC configured to improve the efficiency and functionality of radio-frequency (RF) circuits through a multi-material, multi-layered architecture. These aspects can integrate silicon-based complementary metal-oxide semiconductor (CMOS) technology with other semiconductor materials, including Gallium Nitride (GaN), graphene, and/or various semiconductor alloys from the periodic table's Groups II-VI and/or III-V. The 3D-mmWIC can employ a layered structure comprising a silicon substrate, interleaved dielectric layers with embedded metal regions of varying thicknesses and lengths, a semiconductor layer, and/or additional oxide and dielectric layers. This architecture can enable the integration of multiple source, drain, and gate modules, interconnected via a sophisticated metal/oxide network. The disclosed integrated circuit architecture can provide significant advancements in RF circuit integration, offering reductions in size and cost while increasing design flexibility and performance.