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METHOD OF PRODUCING A SEMICONDUCTOR SUBSTRATE WITH MAGNETIC FLUX CONCENTRATORS, AND A MAGNETIC SENSOR DEVICE

发明专利审中
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15权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Jonathan OP DE BEECK; Appo VAN DER WIEL

IPC 分类

H10N 52/1G1R 33/G1R 33/7H10N 52/80

CPC 分类

H10N52/1G1R33/11G1R33/52G1R33/72H10N52/80

A method is for producing a semiconductor wafer having a front side having at least one magnetic sensor element, and a back side, and an interconnection stack having at least one contact area; the method includes the steps of: m) mounting a carrier wafer to the front side; b) thinning the back side; c) providing at least one magnetic concentrator to the front side; d) providing at least one magnetic concentrator to the back side. A magnetic sensor device includes a semiconductor substrate with a magnetic sensor element, a front IMC, and a back IMC, located on opposite sides of the semiconductor substrate.

原文(中文)

A method is for producing a semiconductor wafer having a front side having at least one magnetic sensor element, and a back side, and an interconnection stack having at least one contact area; the method includes the steps of: m) mounting a carrier wafer to the front side; b) thinning the back side; c) providing at least one magnetic concentrator to the front side; d) providing at least one magnetic concentrator to the back side. A magnetic sensor device includes a semiconductor substrate with a magnetic sensor element, a front IMC, and a back IMC, located on opposite sides of the semiconductor substrate.