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档案
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS
发明专利审中
2浏览
§ Ⅰ
卷宗概要
发明人
FUKUSHIMA, Masahiro
申请日
Jun 29, 2025
公开日
Jan 6, 2026
IPC 分类
G03FG03FC07CC07CC07CC07CC07DC07DC08FC08FC08FC08FC09D
CPC 分类
G03FG03FC07CC07DC07DC07CC07CC07CC08FC08FC08FC09DC08F