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AIRWAY FOR A NEGATIVE PRESSURE WOUND DRESSING

发明专利审中
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31权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Manjunath Penagondla

IPC 分类

A61M 1/

CPC 分类

A61M1/913A61M2207/

An airway for a negative pressure wound dressing, the airway comprising a first strip of material having a first surface comprising at least one groove, the airway further comprising a film arranged over the first surface of the first strip of material and adhered to the first strip of material around its longitudinal edges, wherein the at least one groove is provided with at least one projection to form at least two channels between the first strip and the film, wherein the airway further comprises a second strip of material having a first surface comprising at least one groove provided with at least one projection, the first surface of the second strip of material being arranged over the film and adhered to the film around its longitudinal edges to form at least two channels, between the second strip and the film.

原文(中文)

An airway for a negative pressure wound dressing, the airway comprising a first strip of material having a first surface comprising at least one groove, the airway further comprising a film arranged over the first surface of the first strip of material and adhered to the first strip of material around its longitudinal edges, wherein the at least one groove is provided with at least one projection to form at least two channels between the first strip and the film, wherein the airway further comprises a second strip of material having a first surface comprising at least one groove provided with at least one projection, the first surface of the second strip of material being arranged over the film and adhered to the film around its longitudinal edges to form at least two channels, between the second strip and the film.