MODIFIED OBJECT AND MANUFACTURING METHOD THEREOF
卷宗概要
发明人
Chung-Wei Cheng; Ying-Ru Shih; Jia-Fan Kuo; Bo-Kai Wang
IPC 分类
CPC 分类
A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.
原文(中文)
A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.