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MODIFIED OBJECT AND MANUFACTURING METHOD THEREOF

发明专利审中
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20权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Chung-Wei Cheng; Ying-Ru Shih; Jia-Fan Kuo; Bo-Kai Wang

IPC 分类

B23K 26/53B23K 26/622B23K 103/

CPC 分类

B23K26/53B23K26/624B23K2103/56

A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.

原文(中文)

A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.