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CERAMIC SUBSTRATE, CERAMIC CIRCUIT BOARD, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING SLURRY, AND METHOD FOR APPLYING RELEASE AGENT

发明专利审中
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18权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Zen ITO; Masaaki HIGUCHI; Keita IMANAKA; Masamitsu KIMURA; Hiroyasu KONDO

IPC 分类

C4B 41/45C4B 35/581C4B 35/584C4B 41/50C11D 11/H5K 1/3

CPC 分类

C4B41/459C4B35/581C4B35/584C4B41/5064C11D11/94H5K1/306C4B2235/3865C4B2235/3873

A ceramic substrate according to an embodiment has a first surface as a front surface and a second surface as a back surface, when a midpoint of a line segment connecting a central portion Pof the first surface and a central portion Pof the second surface is defined as a midpoint portion C, an amount of a component of a release agent measured at the central portion Pof the first surface or the central portion Pof the second surface is five times or more an amount of the component of the release agent measured at the midpoint portion C. A ratio P/Pbetween the amount of the component of the release agent measured at the central portion Pand the amount of the component of the release agent measured at the central portion Ppreferably satisfies 0.5≤P/P≤2.

原文(中文)

A ceramic substrate according to an embodiment has a first surface as a front surface and a second surface as a back surface, when a midpoint of a line segment connecting a central portion Pof the first surface and a central portion Pof the second surface is defined as a midpoint portion C, an amount of a component of a release agent measured at the central portion Pof the first surface or the central portion Pof the second surface is five times or more an amount of the component of the release agent measured at the midpoint portion C. A ratio P/Pbetween the amount of the component of the release agent measured at the central portion Pand the amount of the component of the release agent measured at the central portion Ppreferably satisfies 0.5≤P/P≤2.