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BASE MATERIAL AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE

发明专利审中
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8权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Junichi Tsuchiya; Ryutaro Sugawara

IPC 分类

C9D 153/C8F 297/2

CPC 分类

C9D153/C8F297/23C8F297/26

A base material capable of forming a phase-separated structure excellent in horizontal orientation. The base material contains a block copolymer including a block (A1) having a constituent unit represented by the following Formula (a1) and a block (A2) having a constituent unit represented by the following Formula (a2), and a molar ratio of the constituent unit of the block (A2) of more than 0 mol % and 40 mol % or less. In Formula (a1), Rrepresents a hydrogen atom, Rrepresents a substituent, and n is an integer of 0 to 5; and in Formula (a2), Rrepresents a hydrogen atom, Lrepresents a single bond, and Yrepresents a divalent linking group having 1 to 15 carbon atoms

原文(中文)

A base material capable of forming a phase-separated structure excellent in horizontal orientation. The base material contains a block copolymer including a block (A1) having a constituent unit represented by the following Formula (a1) and a block (A2) having a constituent unit represented by the following Formula (a2), and a molar ratio of the constituent unit of the block (A2) of more than 0 mol % and 40 mol % or less. In Formula (a1), Rrepresents a hydrogen atom, Rrepresents a substituent, and n is an integer of 0 to 5; and in Formula (a2), Rrepresents a hydrogen atom, Lrepresents a single bond, and Yrepresents a divalent linking group having 1 to 15 carbon atoms