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TREATMENT LIQUID AND TREATMENT METHOD

发明专利审中
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20权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

Kazutaka Takahashi; Akihiko Ohtsu; Tomonori Takahashi

IPC 分类

C9K 13/8

CPC 分类

C9K13/8

An object of the present invention is to provide a treatment liquid which, in a case of being applied to an object to be treated containing a silicon-germanium-containing substance and a silicon-containing substance, selectively dissolves the silicon-germanium-containing substance and suppresses a variation in a dissolution rate between a central portion and an end portion in the silicon-germanium-containing substance. The treatment liquid of the present invention is a treatment liquid used for an object to be treated, which contains a silicon-germanium-containing substance and a silicon-containing substance, to remove at least a part of the silicon-germanium-containing substance, the treatment liquid containing a fluoride ion source, an organic acid, an oxidant, a solvent having a relative permittivity of 10 or less, and water, in which a content of the water is more than 0% by mass and less than 30% by mass with respect to the total mass of the treatment liquid.

原文(中文)

An object of the present invention is to provide a treatment liquid which, in a case of being applied to an object to be treated containing a silicon-germanium-containing substance and a silicon-containing substance, selectively dissolves the silicon-germanium-containing substance and suppresses a variation in a dissolution rate between a central portion and an end portion in the silicon-germanium-containing substance. The treatment liquid of the present invention is a treatment liquid used for an object to be treated, which contains a silicon-germanium-containing substance and a silicon-containing substance, to remove at least a part of the silicon-germanium-containing substance, the treatment liquid containing a fluoride ion source, an organic acid, an oxidant, a solvent having a relative permittivity of 10 or less, and water, in which a content of the water is more than 0% by mass and less than 30% by mass with respect to the total mass of the treatment liquid.