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DEPOSITION MASK, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE MANUFACTURED BY USING THE SAME

发明专利审中
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20权利要求 · 3 独立
§ Ⅰ

卷宗概要

IPC 分类

C23C 14/4G2B 27/1H10K 59/12H10K 71/16

CPC 分类

C23C14/42G2B27/172H10K59/1201H10K71/166G2B2027/178

A deposition mask includes a mask frame with a cell opening defined therein and a membrane disposed on the mask frame. The membrane includes a cell region disposed on the cell opening, a plurality of pixel openings is defined in the cell region to be connected to the cell opening, and an interfacial residual stress between the mask frame and the membrane is in a range of about −30 MPa to about 30 MPa.

原文(中文)

A deposition mask includes a mask frame with a cell opening defined therein and a membrane disposed on the mask frame. The membrane includes a cell region disposed on the cell opening, a plurality of pixel openings is defined in the cell region to be connected to the cell opening, and an interfacial residual stress between the mask frame and the membrane is in a range of about −30 MPa to about 30 MPa.