METAL FOIL CONTINUOUS PLATING APPARATUS, METAL FOIL CONTINUOUS PLATING METHOD, AND METHOD FOR MANAGING ELECTROLYTE SOLUTION OF CONTINUOUS PLATING APPARATUS
卷宗概要
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION OF SUNCHON NATIONAL UNIVERSITY
发明人
Yong Bum PARK; In Gyeong KIM
IPC 分类
CPC 分类
A metal foil continuous plating apparatus includes an electrolytic bath for accommodating an electrolyte solution, a positive electrode arranged inside the electrolytic bath, a negative electrode arranged at a predetermined interval from the positive electrode so as to face the positive electrode, and a power supply device for applying a current to the positive electrode and the negative electrode, wherein the electrolyte solution is supplied to one side of a space formed between the positive electrode and the negative electrode, and the electrolyte solution is discharged from the other side of the space, wherein the height of the one side to which the electrolyte solution is supplied is formed higher than that of the other side so that the metal ions contained in the electrolyte solution are electro-deposited on the negative electrode, thereby forming a metal foil.
原文(中文)
A metal foil continuous plating apparatus includes an electrolytic bath for accommodating an electrolyte solution, a positive electrode arranged inside the electrolytic bath, a negative electrode arranged at a predetermined interval from the positive electrode so as to face the positive electrode, and a power supply device for applying a current to the positive electrode and the negative electrode, wherein the electrolyte solution is supplied to one side of a space formed between the positive electrode and the negative electrode, and the electrolyte solution is discharged from the other side of the space, wherein the height of the one side to which the electrolyte solution is supplied is formed higher than that of the other side so that the metal ions contained in the electrolyte solution are electro-deposited on the negative electrode, thereby forming a metal foil.