TUBE ARRANGEMENT POLISHED BY FORCED ELECTROLYTIC PLASMA POLISHING IN SECTIONS, IN PARTICULAR A MEASURING TUBE ARRANGEMENT, MEASURING SENSOR WITH SUCH A MEASURING TUBE ARRANGEMENT, AND METHOD FOR PLASMA POLISHING A MEASURING TUBE ARRANGEMENT
卷宗概要
发明人
Julien Zimmermann; Lisa Zwittnig; Yannick Populus
IPC 分类
CPC 分类
A measuring tube arrangement has two support bodies, each with at least one bore, and a measuring tube with a lumen for guiding a medium. The measuring tube has a first end portion and a second end portion which are each connected to one of the support bodies. The tube arrangement has a portion that is polished by forced electrolytic plasma polishing that extends over at least three diameters of the tube. The portion polished by forced electrolytic plasma polishing is followed by an etched portion having a different surface structure than the portion polished by forced electrolytic plasma polishing.
原文（中文）
A measuring tube arrangement has two support bodies, each with at least one bore, and a measuring tube with a lumen for guiding a medium. The measuring tube has a first end portion and a second end portion which are each connected to one of the support bodies. The tube arrangement has a portion that is polished by forced electrolytic plasma polishing that extends over at least three diameters of the tube. The portion polished by forced electrolytic plasma polishing is followed by an etched portion having a different surface structure than the portion polished by forced electrolytic plasma polishing.