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DETECTION OF STRUCTURAL DEFECTS IN AN INTEGRATED CIRCUIT

发明专利审中
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25权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Laurent Lopez

IPC 分类

G1R 31/28H1L 23/10

CPC 分类

G1R31/2884G1R31/2843H1L23/10

The integrated circuit is equipped with an annular wall including, in a first part, an alternation of conductive stacks containing metal tracks distributed over several metal levels and having an alternately reversed trapezoidal longitudinal section, all these tracks forming together at least one electrically conductive path having at least one staircase portion in a second part of the wall. Defect-detection circuit are located in the integrated circuit and connected to semiconductor zones buried in the substrate under the second part of the wall and connected to the two ends of the at least one electrically conductive path.

原文(中文)

The integrated circuit is equipped with an annular wall including, in a first part, an alternation of conductive stacks containing metal tracks distributed over several metal levels and having an alternately reversed trapezoidal longitudinal section, all these tracks forming together at least one electrically conductive path having at least one staircase portion in a second part of the wall. Defect-detection circuit are located in the integrated circuit and connected to semiconductor zones buried in the substrate under the second part of the wall and connected to the two ends of the at least one electrically conductive path.