ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
卷宗概要
发明人
Masahiro Fukushima
IPC 分类
CPC 分类
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.
原文（中文）
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.