RESIST COMPOSITION AND PATTERN FORMING PROCESS
卷宗概要
发明人
Yutaro Otomo; Takahiro Suzuki; Kazuhiro Katayama; Takeshi Sasami; Tatsuya Suzuki; Yoshihiro Tsuji
IPC 分类
CPC 分类
A resist composition comprising a base polymer comprising repeat units consisting of an iodized carboxylic acid anion bonded to the backbone and an organic cation and repeat units consisting of an iodized sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and resolution. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.
原文（中文）
A resist composition comprising a base polymer comprising repeat units consisting of an iodized carboxylic acid anion bonded to the backbone and an organic cation and repeat units consisting of an iodized sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and resolution. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.