CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
卷宗概要
发明人
Masahiro Fukushima; Satoshi Watanabe; Kenji Funatsu; Keiichi Masunaga; Masaaki Kotake; Yuta Matsuzawa
IPC 分类
CPC 分类
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.
原文（中文）
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.