PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM
卷宗概要
发明人
Tomotaka Yamada; Keiichi Ibata; Masaru Takeshita
IPC 分类
CPC 分类
A photosensitive composition having both etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generating agent, the photoacid generating agent including a photoacid generating agent having a sulfonium cation including an iodine atom.
原文（中文）
A photosensitive composition having both etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generating agent, the photoacid generating agent including a photoacid generating agent having a sulfonium cation including an iodine atom.