LAMELLA PREPARATION FROM THICK HPF SAMPLES
卷宗概要
发明人
Radovan SPURNY; John Mark MITCHELS; Ronald KELLEY; Abhay KOTECHA; Dimple KARIA; Xianjun ZHANG; Sven Klumpe
IPC 分类
CPC 分类
Techniques for preparing a sample are described. A method includes directing a beam of ions toward a first surface of a sample for a first exposure of the first surface. The sample can define the first surface and a second surface, opposing the first surface. The method can include rotating the sample through an angle, β, relative to a beam axis, B of the charged particle beam system, to orient the second surface to receive the beam of ions. The method can include directing the beam of ions toward the second surface of the sample. The method can include rotating the sample relative to the beam axis, B, to orient the first surface to receive the beam of ions. The method can also include directing the beam of ions toward the first surface of the sample for a second exposure of the first surface.
原文（中文）
Techniques for preparing a sample are described. A method includes directing a beam of ions toward a first surface of a sample for a first exposure of the first surface. The sample can define the first surface and a second surface, opposing the first surface. The method can include rotating the sample through an angle, β, relative to a beam axis, B of the charged particle beam system, to orient the second surface to receive the beam of ions. The method can include directing the beam of ions toward the second surface of the sample. The method can include rotating the sample relative to the beam axis, B, to orient the first surface to receive the beam of ions. The method can also include directing the beam of ions toward the first surface of the sample for a second exposure of the first surface.