METHOD OF CONTROLLING HIGH-FREQUENCY POWER SUPPLY SYSTEM
卷宗概要
发明人
Yuichi HASEGAWA; Yuya UENO
IPC 分类
CPC 分类
A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, and a first matcher. The first power supply performs frequency modulation control in a second power supply ON period and performs frequency offset control to output a forward wave voltage VFhaving a fundamental frequency Fobtained by adding an offset frequency to a fundamental frequency Fin a second power supply OFF period. An optimum value of an initial phase α of a modulation signal is searched for, and an offset frequency Fos at which a difference between a reflection coefficient ρor load-side impedance Zcorresponding to a center of a locus and a reflection coefficient ρor load-side impedance Zis minimum is searched for, and the fundamental frequency Fin the second power supply OFF period is set.
原文（中文）
A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, and a first matcher. The first power supply performs frequency modulation control in a second power supply ON period and performs frequency offset control to output a forward wave voltage VFhaving a fundamental frequency Fobtained by adding an offset frequency to a fundamental frequency Fin a second power supply OFF period. An optimum value of an initial phase α of a modulation signal is searched for, and an offset frequency Fos at which a difference between a reflection coefficient ρor load-side impedance Zcorresponding to a center of a locus and a reflection coefficient ρor load-side impedance Zis minimum is searched for, and the fundamental frequency Fin the second power supply OFF period is set.