MOVEABLE EDGE RINGS FOR PLASMA PROCESSING SYSTEMS
卷宗概要
发明人
Christopher KIMBALL; Darrell EHRLICH; Johnny PHAM
IPC 分类
CPC 分类
An edge ring system includes a moveable top ring and a cover ring configured to be arranged above and radially outward of the moveable top ring. The cover ring includes an annular body and a stepped portion extending radially inward from the annular body. The stepped portion is configured to extend above an outer edge of the moveable top ring. An annular recess is defined in an inner radius of the cover ring below the stepped portion. The moveable top ring includes an annular body and a curved outer radius. A ring centering portion is formed in a lower surface of the annular body and configured to center the moveable top ring on a moveable support ring.
原文（中文）
An edge ring system includes a moveable top ring and a cover ring configured to be arranged above and radially outward of the moveable top ring. The cover ring includes an annular body and a stepped portion extending radially inward from the annular body. The stepped portion is configured to extend above an outer edge of the moveable top ring. An annular recess is defined in an inner radius of the cover ring below the stepped portion. The moveable top ring includes an annular body and a curved outer radius. A ring centering portion is formed in a lower surface of the annular body and configured to center the moveable top ring on a moveable support ring.