SPIN ON CARBON HARDMASK COMPOSITIONS WITH LOW EVAPORATION LOSS AND PATTERNING METHOD BY USING THE SAME
卷宗概要
发明人
Su Jin LEE; Gi Hong KIM; Seung Hun LEE; Seung Hyun LEE
IPC 分类
CPC 分类
The objective is to provide a spin-on hardmask composition exhibiting a small evaporation loss and being suitable for use in a semiconductor photolithography process which means to provide a composition containing a polymer represented by Formula 1, a surfactant, and an organic solvent and a patterning method using the same composition. The hardmask produced by the method has the effect of a yield improvement with excellent heat resistance by minimizing evaporation loss which is a cause of defects in a process.
原文（中文）
The objective is to provide a spin-on hardmask composition exhibiting a small evaporation loss and being suitable for use in a semiconductor photolithography process which means to provide a composition containing a polymer represented by Formula 1, a surfactant, and an organic solvent and a patterning method using the same composition. The hardmask produced by the method has the effect of a yield improvement with excellent heat resistance by minimizing evaporation loss which is a cause of defects in a process.