METHOD AND APPARATUS FOR ETCHING A SURFACE
卷宗概要
发明人
Matthew Surman; Mikhail Krishtab; Elisa K. Atosuo; Tao Xu; Elina Färm; Charles Dezelah; Patricio Eduardo Romero
IPC 分类
CPC 分类
Methods and related systems for etching. Embodiments of the present disclosure comprise etching an etchable layer by executing a cyclical etching process comprising a plurality of etching cycles. Ones from the plurality of etching cycles comprise a volatilization reactant pulse that comprises exposing a substrate to a volatilization reactant.
原文（中文）
Methods and related systems for etching. Embodiments of the present disclosure comprise etching an etchable layer by executing a cyclical etching process comprising a plurality of etching cycles. Ones from the plurality of etching cycles comprise a volatilization reactant pulse that comprises exposing a substrate to a volatilization reactant.