PROCESS GAS MONITORING APPARATUS, VOLATILIZATION VESSEL, SUBSTRATE PROCESSING APPARATUS, AND METHOD
卷宗概要
发明人
SunJoo Park; HakJoo Lee; WanGyu Lim; SeungMin Shin; Junli Li
IPC 分类
CPC 分类
This disclosure relates to a process gas monitoring apparatus, a volatilization vessel, a substrate processing apparatus, and a method for monitoring supply of process gas into a process chamber. The process gas comprises a chemical substance thermally decomposable to form a decomposition product, and the method comprises measuring concentration of the decomposition product in the process gas.
原文（中文）
This disclosure relates to a process gas monitoring apparatus, a volatilization vessel, a substrate processing apparatus, and a method for monitoring supply of process gas into a process chamber. The process gas comprises a chemical substance thermally decomposable to form a decomposition product, and the method comprises measuring concentration of the decomposition product in the process gas.