GAS INJECTION SYSTEMS, REACTOR SYSTEMS INCLUDING GAS INJECTION SYSTEMS, AND METHODS FOR SUPPLYING A PROCESS GAS TO A REACTION CHAMBER
卷宗概要
发明人
Chuwei Chen; Wentao Wang; Junwei Su; Alexandros Demos
IPC 分类
CPC 分类
Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.
原文（中文）
Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.