SUBSTRATE PROCESSING APPARATUS
卷宗概要
发明人
Kenji AMAHISA; Shinichi TANIGUCHI; Akihiro IWASAKI
IPC 分类
CPC 分类
In a substrate processing apparatus, a carrier that contains a plurality of substrates is transported by a plurality of transport devices on a predetermined transport path from a start point to an end point. In a processing section provided in part of the transport path, a predetermined process is executed on the plurality of substrates contained in the carrier by a liquid processing unit. In the transport path, a posture changer that changes the posture of the carrier between a vertical posture and a horizontal posture is provided. The posture changer changes the posture of the carrier such that the carrier keeps the vertical posture in the processing portion and the carrier is kept having the horizontal posture in the portion except for the processing section.
原文（中文）
In a substrate processing apparatus, a carrier that contains a plurality of substrates is transported by a plurality of transport devices on a predetermined transport path from a start point to an end point. In a processing section provided in part of the transport path, a predetermined process is executed on the plurality of substrates contained in the carrier by a liquid processing unit. In the transport path, a posture changer that changes the posture of the carrier between a vertical posture and a horizontal posture is provided. The posture changer changes the posture of the carrier such that the carrier keeps the vertical posture in the processing portion and the carrier is kept having the horizontal posture in the portion except for the processing section.