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PROCESSES AND APPLICATIONS FOR CATALYST INFLUENCED CHEMICAL ETCHING

发明专利审中
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64权利要求 · 1 独立
§ Ⅰ

卷宗概要

发明人

Sidlgata V. Sreenivasan; Paras Ajay; Akhila Mallavarapu; Crystal Barrera

IPC 分类

H1L 21/683H1L 21/3065H1L 21/66H1L 21/67H1L 21/68H1L 21/687H1L 23/H1L 23/544H10D 88/

CPC 分类

H1L21/6833H1L21/3065H1L21/67069H1L21/67132H1L21/67259H1L21/68H1L21/6836H1L21/6838H1L21/68721H1L21/68771H1L22/14H1L23/544H1L24/75H1L24/83H10D88/H1L2221/68327H1L2221/68368H1L2223/54426H1L2224/75744H1L2224/80006H1L2224/80908H1L2224/83005H1L2224/83908

A system for assembling fields from a source substrate onto a second substrate. The source substrate includes fields. The system further includes a transfer chuck that is used to pick at least four of the fields from the source substrate in parallel to be transferred to the second substrate, where the relative positions of the at least four of the fields is predetermined.

原文(中文)

A system for assembling fields from a source substrate onto a second substrate. The source substrate includes fields. The system further includes a transfer chuck that is used to pick at least four of the fields from the source substrate in parallel to be transferred to the second substrate, where the relative positions of the at least four of the fields is predetermined.