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STRUCTURES WITH ENHANCED THERMAL HEAT SPREADING AND REMOVAL

发明专利审中
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20权利要求 · 2 独立
§ Ⅰ

卷宗概要

发明人

John Knickerbocker; John W Golz; Keiji Matsumoto; Mukta Ghate Farooq

IPC 分类

H1L 23/528H1L 23/367H1L 23/522H1L 25/65

CPC 分类

H1L23/5283H1L23/3675H1L23/5226H1L23/5286H1L25/657H1L2225/6541

Structures including semiconductor chips (including chiplets and stacked chips/chiplets) are provided in which thermal heat removal is enhanced. The enhanced thermal heat removal is provided by utilizing interlayer dielectric (ILD) materials in at least one of the frontside back-end-of-the-line (BEOL) structure or the backside BEOL structure that have a high thermal conductivity.

原文(中文)

Structures including semiconductor chips (including chiplets and stacked chips/chiplets) are provided in which thermal heat removal is enhanced. The enhanced thermal heat removal is provided by utilizing interlayer dielectric (ILD) materials in at least one of the frontside back-end-of-the-line (BEOL) structure or the backside BEOL structure that have a high thermal conductivity.