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CONTAMINATION FREE COPPER INTERCONNECT ON ALUMINUM PAD

发明专利审中
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20权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Shafaat AHMED; Darren DENARDIS

IPC 分类

H1L 23/

CPC 分类

H1L24/5H1L24/8H1L24/3H1L2224/355H1L2224/5085H1L2224/5124H1L2224/5186H1L2224/5647H1L2224/8225

Embodiments disclosed herein include an apparatus that comprises a pad, and the pad comprises aluminum. In an embodiment, a liner is on a sidewall of the pad, and the liner extends past a surface of the pad. In an embodiment, a first layer is over the pad, and the first layer comprises copper. In an embodiment, a second layer is over the first layer, and the second layer is a dielectric material. In an embodiment, a via that passes through the second layer and contacts the first layer.

原文(中文)

Embodiments disclosed herein include an apparatus that comprises a pad, and the pad comprises aluminum. In an embodiment, a liner is on a sidewall of the pad, and the liner extends past a surface of the pad. In an embodiment, a first layer is over the pad, and the first layer comprises copper. In an embodiment, a second layer is over the first layer, and the second layer is a dielectric material. In an embodiment, a via that passes through the second layer and contacts the first layer.