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RESISTIVE MEMORY DEVICE

发明专利审中
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21权利要求 · 4 独立
§ Ⅰ

卷宗概要

发明人

Chungman KIM; Bonwon KOO; Dongho AHN; Kiyeon YANG; Chang Seung LEE; Zhe WU

IPC 分类

H10B 63/G11C 13/H10B 63/10H10N 70/H10N 70/20

CPC 分类

H10B63/24H10B63/10H10B63/84H10N70/231H10N70/826H10N70/8825G11C13/4G11C13/3G11C2213/72

A resistive memory device including a resistive memory pattern; and a selection element pattern electrically connected to the resistive memory pattern, the selection element pattern including a chalcogenide switching material and at least one metallic material, the chalcogenide switching material including germanium, arsenic, and selenium, and the at least one metallic material including aluminum, strontium, or indium, wherein the selection element pattern includes an inhomogeneous material layer in which content of the at least one metallic material in the selection element pattern is variable according to a position within the selection element pattern.

原文(中文)

A resistive memory device including a resistive memory pattern; and a selection element pattern electrically connected to the resistive memory pattern, the selection element pattern including a chalcogenide switching material and at least one metallic material, the chalcogenide switching material including germanium, arsenic, and selenium, and the at least one metallic material including aluminum, strontium, or indium, wherein the selection element pattern includes an inhomogeneous material layer in which content of the at least one metallic material in the selection element pattern is variable according to a position within the selection element pattern.