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MULTIGATE SEMICONDUCTOR DEVICES WITH VARIED THRESHOLD VOLTAGE CHARACTERISTICS

发明专利审中
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20权利要求 · 3 独立
§ Ⅰ

卷宗概要

发明人

Akira Ito; Sim Loo

IPC 分类

H1L 29/78H1L 29/6H1L 29/8

CPC 分类

H10D30/6215H10D30/6211H10D30/65H10D62/116H10D62/155H10D62/159

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.

原文(中文)

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.