元の名称記録: SCREEN Holdings Co., Ltd.

A substrate processing method includes: holding a substrate having a first main surface and a second main surface; rotating the substrate and supplying a hydrofluoric acid-containing liquid to the second main surface of the substrate, the hydrofluoric acid-containing liquid containing hydrofluoric acid; after supplying the hydrofluoric acid-containing liquid to the second main surface of the substrate, rotating the substrate and supplying a rinse liquid to the second main surface of the substrate; and after supplying the rinse liquid to the second main surface of the substrate, rotating the substrate and supplying a hydrophobizing liquid to the first main surface of the substrate.