MODIFIED OBJECT AND MANUFACTURING METHOD THEREOF
案件概要
発明者
Chung-Wei Cheng; Ying-Ru Shih; Jia-Fan Kuo; Bo-Kai Wang
IPC分類
CPC分類
A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.
原文(中国語)
A modified object includes a single crystal substrate, an internal modification trace and a surface processing trace. The single crystal substrate has a first surface and a second surface facing away from the first surface. The first surface and the second surface of the single crystal substrate are arranged in a thickness direction of the single crystal substrate. The internal modification trace is formed between the first surface and the second surface of the single crystal substrate. The surface processing trace are formed on the second surface of the single crystal substrate. The internal modification trace and the surface processing trace overlap in the thickness direction of the single crystal substrate. In addition, a method for manufacturing the modified object is also provided.
外部リソース