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案件記録

METHOD OF STORING HIGH PURITY ALKYL TIN COMPOUNDS

発明審査中
2閲覧数
12請求項 · 4 独立
§ Ⅰ

案件概要

発明者

Li YANG; Yuta HIOKI

IPC分類

C7F 7/22

CPC分類

C7F7/2284C7F7/2296

Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe)are described. Ris selected from R, Rand R; Ris a primary alkyl group having about 1 to 10 carbon atoms, Ris a secondary alkyl group having about 3 to 10 carbon atoms, and Ris a tertiary alkyl group having about 3 to 10 carbon atoms; each Ris independently an alkyl group having about 1 to 10 carbon atoms; and a content of RSn(NR)(N(R)CHNR) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.

原文(中国語)

Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe)are described. Ris selected from R, Rand R; Ris a primary alkyl group having about 1 to 10 carbon atoms, Ris a secondary alkyl group having about 3 to 10 carbon atoms, and Ris a tertiary alkyl group having about 3 to 10 carbon atoms; each Ris independently an alkyl group having about 1 to 10 carbon atoms; and a content of RSn(NR)(N(R)CHNR) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.

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