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案件記録

PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP

発明審査中
3閲覧数
8請求項 · 1 独立
§ Ⅰ

案件概要

発明者

Hitomi MANIWA; Tetsuro KINOSHITA

IPC分類

C9D 5/32C9D 129/4H1L 21/311H1L 21/78

CPC分類

C9D5/32C9D129/4H1L21/31127H1L21/78

A protective film forming agent for forming a protective film on a surface of a semiconductor wafer in dicing the semiconductor wafer, in which the protective film forming agent can form a protective film having excellent laser processability and reduced occurrence of cracks, and a method of manufacturing a semiconductor chip using the protective film forming agent. The protective film forming agent includes a water-soluble resin, a light absorbing agent, at least one monosaccharide or disaccharide plasticizer, and a solvent. The water-soluble resin may include a water-soluble resin having an aromatic ring and a water-soluble group.

原文(中国語)

A protective film forming agent for forming a protective film on a surface of a semiconductor wafer in dicing the semiconductor wafer, in which the protective film forming agent can form a protective film having excellent laser processability and reduced occurrence of cracks, and a method of manufacturing a semiconductor chip using the protective film forming agent. The protective film forming agent includes a water-soluble resin, a light absorbing agent, at least one monosaccharide or disaccharide plasticizer, and a solvent. The water-soluble resin may include a water-soluble resin having an aromatic ring and a water-soluble group.

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