検索に戻る
案件記録

SHOWERHEAD WITH CONTROLLED VAPOR DEPOSITION UNIFORMITY

発明審査中
3閲覧数
15請求項 · 2 独立
§ Ⅰ

案件概要

発明者

Hyman Lam; Shinjae Hwang; Ziyun Huang; Yun-Tai Yeh; Vince Kirchhoff; Dien-Yeh Wu; Chengyu Wen

IPC分類

C23C 16/52C23C 16/455H1L 21/66

CPC分類

C23C16/52C23C16/45544C23C16/45565H1L22/12

A vapor deposition chamber showerhead faceplate having a thickness and a plurality of zones between a center of the faceplate and the peripheral edge. The faceplate includes a plurality of gas openings, each of the plurality of gas openings comprising an overall length that extends through the thickness of the showerhead faceplate, the overall length defined by an upper part having an upper part length and a lower part having a lower part length, the upper part having a first diameter and the lower part having a second diameter that is less than the first diameter, wherein the lower part length of a first portion of the plurality of gas openings in a first zone is different than the lower part length of a second portion of the plurality of gas openings in a second zone.

原文(中国語)

A vapor deposition chamber showerhead faceplate having a thickness and a plurality of zones between a center of the faceplate and the peripheral edge. The faceplate includes a plurality of gas openings, each of the plurality of gas openings comprising an overall length that extends through the thickness of the showerhead faceplate, the overall length defined by an upper part having an upper part length and a lower part having a lower part length, the upper part having a first diameter and the lower part having a second diameter that is less than the first diameter, wherein the lower part length of a first portion of the plurality of gas openings in a first zone is different than the lower part length of a second portion of the plurality of gas openings in a second zone.

外部リソース