MASK PATTERN FORMATION METHOD AND SUBSTRATE PROCESSING METHOD
案件概要
出願人
Tokyo Electron Limited; NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY
発明者
Shin OOWADA; Ryuichi ASAKO; Makoto MURAMATSU; Tsutomu ONO; Takaichi WATANABE
IPC分類
CPC分類
A mask pattern formation method includes applying a substance that includes a polymerizable ionic liquid to a substrate, causing a polymerization reaction of the polymerizable ionic liquid for at least a part of the substance that includes a polymerizable ionic liquid to produce a substance that include a polymeric ionic liquid on the substrate, and forming a mask pattern of the substance that includes a polymeric ionic liquid on the substrate by using the substance that includes a polymeric ionic liquid.
原文（中国語）
A mask pattern formation method includes applying a substance that includes a polymerizable ionic liquid to a substrate, causing a polymerization reaction of the polymerizable ionic liquid for at least a part of the substance that includes a polymerizable ionic liquid to produce a substance that include a polymeric ionic liquid on the substrate, and forming a mask pattern of the substance that includes a polymeric ionic liquid on the substrate by using the substance that includes a polymeric ionic liquid.
外部リソース