ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
案件概要
発明者
Masahiro Fukushima
IPC分類
CPC分類
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.
原文（中国語）
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.
外部リソース