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案件記録

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

発明審査中
2閲覧数
20請求項 · 1 独立
§ Ⅰ

案件概要

発明者

Taro Miyoshi; Shuhei Yamaguchi; Tomoaki Yoshioka; Eiji Fukuzaki

IPC分類

G3F 7/4G3F 7/39G3F 7/20

CPC分類

G3F7/45G3F7/39G3F7/20

An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.

原文(中国語)

An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.

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