ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
案件概要
発明者
Taro Miyoshi; Shuhei Yamaguchi; Tomoaki Yoshioka; Eiji Fukuzaki
IPC分類
CPC分類
An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.
原文(中国語)
An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.
外部リソース