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案件記録

PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

発明審査中
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Atsuyasu Nozaki; Kazuya Oota

IPC分類

G3F 7/37C9D 179/8G3F 7/28G3F 7/16

CPC分類

G3F7/37C9D179/8G3F7/28G3F7/168

There are provided a photosensitive resin composition including a resin which is a polyimide having a polymerizable group and a weight-average molecular weight of 5,000 or more and less than 30,000, a polymerizable compound, and a photopolymerization initiator; a cured substance obtained by curing the resin composition; a laminate including the cured substance; a manufacturing method for the cured substance; a manufacturing method for a laminate; a manufacturing method for a semiconductor device, including the manufacturing method for the cured substance; and a semiconductor device including the cured substance.

原文(中国語)

There are provided a photosensitive resin composition including a resin which is a polyimide having a polymerizable group and a weight-average molecular weight of 5,000 or more and less than 30,000, a polymerizable compound, and a photopolymerization initiator; a cured substance obtained by curing the resin composition; a laminate including the cured substance; a manufacturing method for the cured substance; a manufacturing method for a laminate; a manufacturing method for a semiconductor device, including the manufacturing method for the cured substance; and a semiconductor device including the cured substance.

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