RESIST COMPOSITION AND PATTERN FORMING PROCESS
案件概要
発明者
Yutaro Otomo; Takahiro Suzuki; Kazuhiro Katayama; Takeshi Sasami; Tatsuya Suzuki; Yoshihiro Tsuji
IPC分類
CPC分類
A resist composition comprising a base polymer comprising repeat units consisting of an iodized carboxylic acid anion bonded to the backbone and an organic cation and repeat units consisting of an iodized sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and resolution. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.
原文（中国語）
A resist composition comprising a base polymer comprising repeat units consisting of an iodized carboxylic acid anion bonded to the backbone and an organic cation and repeat units consisting of an iodized sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and resolution. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.
外部リソース